Ferroelectric (116) SrBi2Nb2O9 thin films epitaxially grown by pulsed laser deposition on epitaxial (110) Pt/(110) SrTiO3 electrode - Université de Rennes Accéder directement au contenu
Article Dans Une Revue Applied Physics Letters Année : 2002

Ferroelectric (116) SrBi2Nb2O9 thin films epitaxially grown by pulsed laser deposition on epitaxial (110) Pt/(110) SrTiO3 electrode

Résumé

Epitaxial SrBi2Nb2O9 thin films have been grown by pulsed-laser deposition on (110)Pt bottom electrode epitaxially grown on (110) SrTiO3 by dc sputtering. X-ray φ-scans and electron channeling patterns reveal the epitaxial growth of the (116) SrBi2Nb2O9/(110)Pt bilayers. The hysteresis loop, dielectric response, and capacitance–voltage characteristics of this bilayer are presented. The remnant polarization was measured to be close to 5 μC/cm2, and the coercive field was calculated to be ∼120 kV/cm. The zero field permittivity was about 150 and the dielectric loss was ∼2%.

Domaines

Matériaux
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Dates et versions

hal-00149629 , version 1 (28-05-2007)

Identifiants

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Jean-René Duclere, Maryline Guilloux-Viry, A. Perrin, Eric Cattan, Caroline Soyer, et al.. Ferroelectric (116) SrBi2Nb2O9 thin films epitaxially grown by pulsed laser deposition on epitaxial (110) Pt/(110) SrTiO3 electrode. Applied Physics Letters, 2002, 81 (11), pp.2067-2069. ⟨10.1063/1.1504179⟩. ⟨hal-00149629⟩
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