Search - Université de Rennes Access content directly

Filter your results

10 Results
authFullName_s : Alfredo Torres

Plasma etching defect formation and changes in the electronic and structural properties of InP/InAsP quantum wells

Jean-Pierre Landesman , Juan Jiménez , Christophe Levallois , Cesare Frigeri , Alfredo Torres et al.
18th Canadian Semiconductor Science and Technology Conference (CSSTC 2017), Oct 2017, Waterloo, Canada
Conference papers hal-01710287v1

Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells

Jean-Pierre Landesman , Juan Jimenez , Christophe Levallois , Frédéric Pommereau , Cesare Frigeri et al.
Journal of Vacuum Science & Technology A, 2016, 34 (4), pp.041304. ⟨10.1116/1.4950445⟩
Journal articles hal-01372796v1

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

Jean-Pierre Landesman , Marc Fouchier , Erwine Pargon , Névine Rochat , Daniel T Cassidy et al.
11th Plasma Etch and Strip in Microtechnology workshop (PESM 2019), May 2019, Grenoble, France
Conference papers hal-02291455v1

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry

Jean-Pierre Landesman , Daniel T. Cassidy , Marc Fouchier , Erwine Pargon , Christophe Levallois et al.
11th International Workshop on Plasma Etch and Strip in Microelectronics (PESM 2019), May 2019, Grenoble, France
Conference papers hal-02324800v1

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry

Jean-Pierre Landesman , Daniel T Cassidy , Erwine Pargon , Christophe Levallois , Merwan Mokhtari et al.
17th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII), Oct 2017, Valladolid, Spain
Conference papers hal-01711092v1
Image document

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl-2/CH4 Plasma Chemistry

Jean-Pierre Landesman , Daniel T Cassidy , Marc Fouchier , Erwine Pargon , Christophe Levallois et al.
Journal of Electronic Materials, 2018, Special Section: 17th Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII), 47 (9), pp.4964-4969. ⟨10.1007/s11664-018-6152-6⟩
Journal articles hal-01861357v1

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry

Jean-Pierre Landesman , Daniel T Cassidy , Erwine Pargon , Christophe Levallois , Merwan Mokhtari et al.
18th Canadian Semiconductor Science and Technology Conference (CSSTC 2017), Aug 2017, Waterloo, Canada
Conference poster hal-01710320v1

Composition profiles in InP/InAsP quantum well structures under the effect of reactives gases during dry etching processes — Luminescence and SIMS

Jean-Pierre Landesman , José Jimenez , V. Hortelano , Yoan Léger , Herve Folliot et al.
26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), May 2014, Montpellier, France. pp.P7, ⟨10.1109/ICIPRM.2014.6880554⟩
Conference papers hal-01132900v1

Degree of polarization of the photo-luminescence and cathodo-luminescence for plasma etched InP and GaAs under control of the built-in mechanical stress in SiNx mask layer

Solène Gérard , Merwan Mokhtari , Jean-Pierre Landesman , Christophe Levallois , Marc Fouchier et al.
18th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVIII), Sep 2019, Berlin, Germany
Conference papers hal-02291428v1
Image document

Mapping of mechanical strain induced by thin and narrow dielectric stripes on InP surfaces

Jean-Pierre Landesman , Daniel T Cassidy , Marc Fouchier , Christophe Levallois , Erwine Pargon et al.
Optics Letters, 2018, 43 (15), pp.3505. ⟨10.1364/OL.43.003505⟩
Journal articles hal-01861356v1