Plasma etching defect formation and changes in the electronic and structural properties of InP/InAsP quantum wells
Jean-Pierre Landesman
,
Juan Jiménez
,
Christophe Levallois
,
Cesare Frigeri
,
Alfredo Torres
et al.
18th Canadian Semiconductor Science and Technology Conference (CSSTC 2017) , Oct 2017, Waterloo, Canada
Conference papers
hal-01710287v1
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Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells
Jean-Pierre Landesman
,
Juan Jimenez
,
Christophe Levallois
,
Frédéric Pommereau
,
Cesare Frigeri
et al.
Journal articles
hal-01372796v1
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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
Jean-Pierre Landesman
,
Marc Fouchier
,
Erwine Pargon
,
Névine Rochat
,
Daniel T Cassidy
et al.
11th Plasma Etch and Strip in Microtechnology workshop (PESM 2019) , May 2019, Grenoble, France
Conference papers
hal-02291455v1
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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
Jean-Pierre Landesman
,
Daniel T. Cassidy
,
Marc Fouchier
,
Erwine Pargon
,
Christophe Levallois
et al.
11th International Workshop on Plasma Etch and Strip in Microelectronics (PESM 2019) , May 2019, Grenoble, France
Conference papers
hal-02324800v1
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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry
Jean-Pierre Landesman
,
Daniel T Cassidy
,
Erwine Pargon
,
Christophe Levallois
,
Merwan Mokhtari
et al.
17th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII) , Oct 2017, Valladolid, Spain
Conference papers
hal-01711092v1
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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl-2/CH4 Plasma Chemistry
Jean-Pierre Landesman
,
Daniel T Cassidy
,
Marc Fouchier
,
Erwine Pargon
,
Christophe Levallois
et al.
Journal of Electronic Materials , 2018, Special Section: 17th Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII), 47 (9), pp.4964-4969.
⟨10.1007/s11664-018-6152-6⟩
Journal articles
hal-01861357v1
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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry
Jean-Pierre Landesman
,
Daniel T Cassidy
,
Erwine Pargon
,
Christophe Levallois
,
Merwan Mokhtari
et al.
18th Canadian Semiconductor Science and Technology Conference (CSSTC 2017) , Aug 2017, Waterloo, Canada
Conference poster
hal-01710320v1
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Composition profiles in InP/InAsP quantum well structures under the effect of reactives gases during dry etching processes — Luminescence and SIMS
Jean-Pierre Landesman
,
José Jimenez
,
V. Hortelano
,
Yoan Léger
,
Herve Folliot
et al.
26th International Conference on Indium Phosphide and Related Materials (IPRM 2014) , May 2014, Montpellier, France. pp.P7,
⟨10.1109/ICIPRM.2014.6880554⟩
Conference papers
hal-01132900v1
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Degree of polarization of the photo-luminescence and cathodo-luminescence for plasma etched InP and GaAs under control of the built-in mechanical stress in SiNx mask layer
Solène Gérard
,
Merwan Mokhtari
,
Jean-Pierre Landesman
,
Christophe Levallois
,
Marc Fouchier
et al.
18th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVIII) , Sep 2019, Berlin, Germany
Conference papers
hal-02291428v1
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Mapping of mechanical strain induced by thin and narrow dielectric stripes on InP surfaces
Jean-Pierre Landesman
,
Daniel T Cassidy
,
Marc Fouchier
,
Christophe Levallois
,
Erwine Pargon
et al.
Journal articles
hal-01861356v1
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