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            <funder>This work is supported by the joint French National Research Agency (ANR)-National Natural Science Foundation of China (NNSFC) ENSEMBLE project (grant nos. ANR-14-CE26-0028-01 and NNSFC 61411136001), Chinese-French International Key Program, National Natural Science Foundation of China (NSFC grant no. 51620105004) and by the French PIA project “Lorraine Université d’Excellence” (grant no. ANR-15-IDEX-04-LUE). C.C. acknowledges the support from CNPq, National Council for Scientific and Technological Development-Brazil. A.D. acknowledges PhD funding from Region Lorraine.</funder>
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                <term xml:lang="en">localized electronic states</term>
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              <p>Due to the difficulty of growing high-quality semiconductors on ferromagnetic metals, the study of spin diffusion transport in Si was limited to lateral geometry devices. In this work, by using an ultrahigh-vacuum wafer-bonding technique, we have successfully fabricated metal–semiconductor–metal CoFeB/MgO/Si/Pt vertical structures. We hereby demonstrate pure spin-current injection and transport in the perpendicular current flow geometry over a distance larger than 2 μm in n-type Si at room temperature. In those experiments, a pure propagating spin current is generated via ferromagnetic resonance spin pumping and converted into a measurable voltage by using the inverse spin Hall effect occurring in the top Pt layer. A systematic study varying both Si and MgO thicknesses reveals the important role played by the localized states at the MgO–Si interface for the spin-current generation. Proximity effects involving indirect exchange interactions between the ferromagnet and the MgO–Si interface states appears to be a prerequisite to establishing the necessary out-of-equilibrium spin population in Si under the spin-pumping action.</p>
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