%0 Journal Article %T Boosting the Performance of BiVO 4 Prepared through Alkaline Electrodeposition with an Amorphous Fe Co-catalyst %+ Lebanese University [Beirut] (LU) %+ Institut des Sciences Chimiques de Rennes (ISCR) %+ Institut de Physique de Rennes (IPR) %A Saada, Hiba %A Abdallah, Rawa %A Fabre, Bruno %A Floner, Didier %A Fryars, Stéphanie %A Vacher, Antoine %A Dorcet, Vincent %A Mériadec, Cristelle %A Ababou-Girard, Soraya %A Loget, Gabriel %Z CNRS %Z Université de Rennes 1 %< avec comité de lecture %@ 2196-0216 %J ChemElectroChem %I Weinheim : Wiley-VCH %V 6 %N 3 %P 613-617 %8 2019-02 %D 2019 %R 10.1002/celc.201801443 %Z Chemical Sciences %Z Physics [physics]Journal articles %X BiVO4 is a promising n‐type semiconductor for water‐splitting photoelectrochemical cells. We report here a new method to prepare BiVO4 photoanodes that is based on an alkaline electrodeposition process, which avoids chemical etching of Bi. In addition, we present a simple and general method to prepare coatings of amorphous FeOx that behave as a co‐catalyst on our BiVO4 material, improving the water splitting photocurrent. %G English %2 https://univ-rennes.hal.science/hal-01952354/document %2 https://univ-rennes.hal.science/hal-01952354/file/Loget%20et%20al_Boosting%20the%20performance%20of%20BiVO4%20prepared%20by%20alkaline%20electrodeposition%20with.pdf %L hal-01952354 %U https://univ-rennes.hal.science/hal-01952354 %~ UNIV-RENNES1 %~ CNRS %~ INSA-RENNES %~ ENSC-RENNES %~ OSUR %~ ISCR %~ SCR_MACSE %~ IPR %~ IPR-MN %~ ZZ-IPR-MN %~ STATS-UR1 %~ UR1-SPM %~ ISCR-PRATS %~ INC-CNRS %~ UR1-UFR-SPM %~ UR1-HAL %~ UR1-SDLM %~ TEST-UR-CSS %~ UNIV-RENNES %~ INSA-GROUPE %~ TEST-HALCNRS %~ UR1-MMS %~ TEST2-HALCNRS