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Communication Dans Un Congrès Année : 2017

Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry

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hal-01711092 , version 1 (16-02-2018)

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  • HAL Id : hal-01711092 , version 1

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Jean-Pierre Landesman, Daniel T Cassidy, Erwine Pargon, Christophe Levallois, Merwan Mokhtari, et al.. Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Chlorine Chemistry. 17th International Conference on Defects-Recognition, Imaging and Physics in Semiconductors (DRIP XVII), Oct 2017, Valladolid, Spain. ⟨hal-01711092⟩
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