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Article Dans Une Revue Silicates Industriels Année : 2004

TaON and Ta3N5 thin films: a new class of gas sensors

Résumé

TaON and Ta3N5 thin films of different thicknesses were prepared by pulsed laser deposition of tantalum oxide followed by ex situ thermal nitridation under ammonia. The nitridation was carried out in flowing moist or dry gas at 800°C. Structural and microstructural characteristics were investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Preliminary gas detection experiments performed with propanal showed promising results.

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Chimie
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Dates et versions

hal-01465348 , version 1 (27-02-2017)

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  • HAL Id : hal-01465348 , version 1

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Odile Merdrignac-Conanec, Marie Kerlau, Maryline Guilloux-Viry, Roger Marchand, Nicolae Bârsan, et al.. TaON and Ta3N5 thin films: a new class of gas sensors. Silicates Industriels, 2004, 69 (5-6), pp.141-145. ⟨hal-01465348⟩
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