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Article Dans Une Revue Journal of Electrostatics Année : 2009

Time dependence of secondary electron yield and of surface potential during charging of amorphous silica target

Résumé

We study herein the charge evolution of a silica amorphous target submitted to an electronic bombardment. During the bombardment, the injected electronic charge and the primary energy as well as the surface bombardment of the target are controlled. The dynamics of the injected charge are described by combining measurements of the secondary electron and X-ray emission using a scanning electron microscope. Thus, we are able to access the evolution of the surface potential and secondary electron yield. Monte-Carlo calculations are used to simulate situations similar to our experiences and to study the effect of certain parameters (density of traps, energy of activation) inaccessible to the measures with our devices.

Dates et versions

hal-01091880 , version 1 (07-12-2014)

Identifiants

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Askri Besma, Khaled Raouadi, Raphaël Renoud, Béchir Yangui. Time dependence of secondary electron yield and of surface potential during charging of amorphous silica target. Journal of Electrostatics, 2009, 67 (4), pp.695-702. ⟨10.1016/j.elstat.2009.03.006⟩. ⟨hal-01091880⟩
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