Electron and ion reactions with hexamethyldisiloxane and pentamethyldisiloxane. - Université de Rennes Accéder directement au contenu
Article Dans Une Revue Journal of Chemical Physics Année : 2007

Electron and ion reactions with hexamethyldisiloxane and pentamethyldisiloxane.

Jean-Luc Le Garrec
Brian J.B.A. Mitchell
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Résumé

The dissociative recombination of electrons with the hexamethyldisiloxane (HMDSO) cation ((CH(3))(3)Si-O-Si(CH(3))(3))(+) and the pentamethyldisiloxane cation ((CH(3))(3)Si-O-Si(CH(2))(2))(+) as well as the ion-molecule reaction between Ar(+) and HMDSO have been studied at 300 K using a flowing afterglow Langmuir probe-mass spectrometer apparatus. The rate constants for these reactions, measured directly for the first time, are, respectively, alpha(1)=1.8 x 10(-6), alpha(2)=3.6 x 10(-6) cm(3)s, and k=2.0 x 10(-9) cm(3)s with uncertainties of +/-30%. In addition, the electronic attachment to neutral HMDSO was also studied and an upper limit value of the rate constant was determined to be beta=3.3 x 10(-11) cm(3)s.
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Dates et versions

hal-00671481 , version 1 (17-02-2012)

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Sophie Carles, Jean-Luc Le Garrec, Brian J.B.A. Mitchell. Electron and ion reactions with hexamethyldisiloxane and pentamethyldisiloxane.. Journal of Chemical Physics, 2007, 127 (14), pp.144308. ⟨10.1063/1.2774984⟩. ⟨hal-00671481⟩
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