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Communication Dans Un Congrès Année : 2010

Selective patterning of covalent molecular grafting on doped amorphous silicon templates

Résumé

Linear alkene molecules have been covalently immobilized on amorphous silicon surfaces. The larger thermal reactivity of n+-doped vs. nominally undoped a-Si:H surfaces towards perfluorodecene (PFD) molecules in the gas phase has been exploited to investigate a selective patterning of molecular grafting on a previously defined template of doped / undoped regions. PFD has been chosen to obtain hydrophobic monomolecular layers with fluorine labelling, useful for photoelectron spectroscopy (XPS) and NanoSIMS imaging. The template was obtained by growing undoped a-Si:H on top of n+ a-Si-H, and defining 40 μm-edge patterns of undoped a-Si:H by reactive ion etching in a (CF4, O2) mixture. After native oxide removal, the patterned surface was exposed to PFD at 230 °C. NanoSIMS images, taken at increasing Cs+ irradiation doses, show the expected 19F and 28Si contrast on as-grafted surfaces; this contrast disappears after ∼340 seconds Cs+ irradiation, corresponding to the desorption of the PFD monomolecular layer. (© 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Dates et versions

hal-00661493 , version 1 (19-01-2012)

Identifiants

Citer

Hussein Sabbah, Virginia Chu, Joao Pedro Conde, Soraya Ababou-Girard, Thomas Delhaye, et al.. Selective patterning of covalent molecular grafting on doped amorphous silicon templates. 23rd International Conference on Amorphous and Microcrystalline Semiconductors, 2010, Utrecht, Netherlands. pp.720-723, ⟨10.1002/pssc.200982674⟩. ⟨hal-00661493⟩
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