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Article Dans Une Revue Optical Materials Année : 2010

Amorphous Tm3+ doped sulfide thin films fabricated by sputtering

Résumé

Amorphous chalcogenide films play a motivating role in the development of integrated planar optical circuits and their components. The aim of the present investigation was to optimize deposition conditions for preparation of pure and Tm3+ doped sulfide films by radio-frequency magnetron sputtering. The study of their composition, morphological characteristics and thermal properties was realized by scanning electronic microscope attached with energy dispersive spectroscopy, Rutherford backscattering, X-ray diffraction, and micro-thermal probe. Some optical properties, like transmission, index of refraction, optical band-gap, propagation modes from 633 to 1540 nm, were investigated on thin films. The whole results point out hopeful perspectives strengthened by the clear observation of the near-infrared photo-luminescence of Tm3+ doped sulfide films.

Domaines

Matériaux

Dates et versions

hal-00608450 , version 1 (13-07-2011)

Identifiants

Citer

Virginie Nazabal, Anne-Marie Jurdyc, P. Nemec, Marie-Laure Brandily-Anne, Laëtitia Petit, et al.. Amorphous Tm3+ doped sulfide thin films fabricated by sputtering. Optical Materials, 2010, 33 (2), pp.220-226. ⟨10.1016/j.optmat.2010.08.023⟩. ⟨hal-00608450⟩
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