Electrical properties and interfacial characteristics of RuO2/HfAlOx/SiON/Si and RuO2/LaAlO3/SiON/Si capacitors - Université de Rennes Accéder directement au contenu
Article Dans Une Revue Journal of The Electrochemical Society Année : 2008

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hal-00492044 , version 1 (14-06-2010)

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V. Edon, Zhenyu Li, M.C. Hugon, C. Krug, K.P. Bastos, et al.. Electrical properties and interfacial characteristics of RuO2/HfAlOx/SiON/Si and RuO2/LaAlO3/SiON/Si capacitors. Journal of The Electrochemical Society, 2008, 155 (9), pp.H661. ⟨10.1149/1.2952529⟩. ⟨hal-00492044⟩
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