Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy - Université de Rennes Accéder directement au contenu
Communication Dans Un Congrès Année : 2008

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hal-00492041 , version 1 (14-06-2010)

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V. Edon, M.C. Hugon, B. Agius, Olivier Durand, C. Eypert, et al.. Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy. EMRS 2007 Fall Meeting Symposium H: Current trends in optical and x-ray metrology of advanced materials and devices II Warsaw, Poland, Sep 2007, Poland. pp.7974, ⟨10.1016/j.tsf.2008.04.006⟩. ⟨hal-00492041⟩
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