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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
Biocapteurs
CNTs’ collapse
X-ray photoelectron spectroscopy
Chalcogenide glass
Atomic force microscopy
Band gap
TiO2
PECVD
Functionalization
A-CNx
Adsorption
Band alignment
Biofilms microbiens
Structure
A1 Characterization
Anatase
CaTiO3Pr^3^+
Semiconductors
Magnetron sputtering
Sputtering
Bipolar resistive switching BRS
NEXAFS
A3 Physical vapor deposition processes
Carbon Nanotube
Thin films
Oxides
Selenization
Mott insulators
Applications industrielles
B2 Quaternary
A Chalcogenides
B2 Semiconducting indium compounds
3 nm in size
Colloidal solution
CIGSe
Chalcogenide
Vanadium Sesquioxide
Carbon
BOMBARDMENT
Plasmas froids
Titanium dioxide
Amyloid precursor
SF 6
Copper
Nanocomposite
Bixbyite
Avalanche breakdown
Chemical and biological sensors
Thin film
Aryl-diazonium salts
Ambipolar material
X-ray diffraction
Physical vapor deposition
A Multilayers
Ablation laser
Atomic layer etching
Alzheimer's disease
Carbon nanotubes
V2O3
B2 Semiconducting alloys
Transfert d'énergie
A Thin films
Residual stress
Sol-gel
B1 Inorganic compounds
Low-pressure plasma processing
Chemical detection
Scanning electron microscopy
Cathepsin
Non-volatile memory
Transmission electron microscopy
Alloying
Aluminium nitride
CHLORINE PLASMAS
Amorphous
Chalcogenides
AlN
TEM
Kirkendall effect
Spectroscopic ellipsometry
AuCu alloy
Biomasse
Resistive switching
Films
XPS
Mott insulator
Calcined clay
Capacitance
B Chemical synthesis
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Plasma etching
AZO thin films
CH4
Etching
Optical properties
Carbon nitride
B3 Solar cells
C Photoelectron spectroscopy
Nanotubes
Buffer Couple