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Article Dans Une Revue Optics Communications Année : 2005

Tailoring silicon radiative properties

Résumé

We study several schemes to enhance the emission of radiation of silicon surfaces in the infrared. First, we investigate the emission pattern of microscale lamellar gratings ruled on doped silicon which is substantially modified due to the excitation of surface plasmons. In addition to their remarkable spectral selectivity, those sources emit 50% more than a plane interface of bulk doped silicon. An interferential antireflection system similar to a Salisbury screen is also considered. This broadband emitter allows a significant enhancement of the total emitted power compared to the plane interface. These results may have broad applications in sensing and radiative cooling.

Dates et versions

hal-00116286 , version 1 (25-11-2006)

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Marine Laroche, François Marquier, Rémi Carminati, Jean-Jacques Greffet. Tailoring silicon radiative properties. Optics Communications, 2005, 250 (4-6), pp.316-320. ⟨10.1016/j.optcom.2005.02.041⟩. ⟨hal-00116286⟩
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